TNO and Ushio strengthen partnership in advancing EUV technologies
Dutch research and technology organization TNO and Japanese light innovator Ushio Inc. have elevated their collaborative efforts with a new five-year maintenance and collaboration agreement. Building on the success of the past five years, during which Ushio served as TNO's strategic supplier and partner for the high-intensity EUV light source in TNO’s EBL2 facility, this extended partnership emphasizes a commitment to continued innovation. TNO's unique EUV exposure and analysis facility, equipped with Ushio's high-intensity EUV light source, enables in-situ measurements within a vacuum environment. The renewed partnership signifies a new chapter in their shared pursuit of cutting-edge advancements and was formally ratified during a signing ceremony at Ushio’s office in Japan.
Unique EUV-partnership.
Since 2015, TNO and Ushio have collaborated in the establishment of the groundbreaking EBL2 facility at TNO’s high-tech research location in Delft. This experimental facility, designed for EUV research and testing, focuses on studying radiation-induced effects on EUV optics and reticles. Ushio's pivotal role includes providing, supporting, and maintaining the high-intensity Sn (Tin) LDP (Laser-assisted Discharge-produced Plasma) EUV light source—a pulse-based system that mimics lithography conditions precisely.
In recent years, the collaboration between TNO and Ushio has deepened, culminating in a new five-year agreement to enhance the maintenance, further improve and increase the reliability and predictability of the EUV light source. Beyond this long-term agreement, both parties have expressed their shared commitment to exploring future opportunities and fostering new innovations within the EUV domain.
'TNO values collaborative efforts with partners and suppliers to deliver exceptional value to our clients. Strengthening our alliance with Ushio empowers us to uphold and enhance our research standards, and propels our ambition to lead in the development of next-generation EUV sources.'
'Ushio has had a great relationship with TNO since 2015 and is pleased that this collaboration will continue. The strong collaboration goes beyond this project and contributes to the evolution of EUV market by further development of our EUV sources. We will spare no effort to improve our EUV light source.'
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Rob Willekers
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Standplaats:Delft - Stieltjesweg
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Email:Email Rob
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